Runway is an applied research company and creative platform that provides machine‑learning powered tools for artists, filmmakers, designers, and content creators. It exposes generative video and image models, real‑time editing operators (background removal, inpainting, object tracking), and cloud rendering to accelerate media production workflows. Runway focuses on making advanced research accessible via an intuitive interface, model library, and collaboration features so teams can iterate on visual ideas, produce high‑fidelity motion content, and integrate models into creative pipelines.